Simulation of dense contact hole (K1=O.35) arrays with 193-nm immersion lithography [6154-106]
- Author(s):
- Raub, A. K. ( Ctr for High Technology Materials, Univ. of New Mexico (USA) and Univ. of New Mexiso (USA) )
- Biswas, A. M ( Ctr for High Technology Materials, Univ. of New Mexico (USA) and Univ. of New Mexiso (USA) )
- Borodovsky, Y. ( Intel Corp. (USA) )
- Allen, G. ( Intel Corp. (USA) )
- Brueck, S. R. J. ( Ctr. for Hig Technology Mateerials, Univ, of New Mexico (USA) and Univ. of New Mexico (USA) )
- Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61542U
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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