Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]
- Author(s):
Kwak, E. A. ( Hanyang Univ. (South Korea) ) Jung, M. R. ( Hanyang Univ. (South Korea) ) Kim, D.-G. ( Hanyang Univ. (South Korea) ) Lee, J.-E. ( Hanyang Univ. (South Korea) ) Oh, H.-K. ( Hanyang Univ. (South Korea) ) Lee, S. ( Samsung Electronics (South Korea) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61542T
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Evaluation of partial coherent imaging using the transfer function in immersion lithography [6154-103]
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Determination of mask induced polarization effects occurring in hyper NA immersion lithography
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Haze detection and haze-induced process latitude variation for low-ki 193 nm lithography [6349-105]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Simulation of dense contact hole (K1=O.35) arrays with 193-nm immersion lithography [6154-106]
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Optimization of chromeless phase mask by comparing scattering bars with zebra patterns [6154-82]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |