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Multiple focal plane exposure in 248nm lithography to improve the process latitude of 110nm contact [6154-89]

Author(s):
Jung, S. ( Macronix Intermational Co. Ltd. (Taiwan) )
Yang, E. ( Macronix Intermational Co. Ltd. (Taiwan) )
Yang, T. H. ( Macronix Intermational Co. Ltd. (Taiwan) )
Chen, K. C. ( Macronix Intermational Co. Ltd. (Taiwan) )
Ku, J. ( Macronix Intermational Co. Ltd. (Taiwan) )
Lu, c.-y. ( Macronix Intermational Co. Ltd. (Taiwan) )
1 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
2
Page(from):
61542F
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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