The investigation of 193nm CPL 3D topology mask effect on wafer process performance [6154-87]
- Author(s):
- Cheng, Y. F. ( United Microelectronics Corp. (Taiwan) )
- Chou, Y. L. ( United Microelectronics Corp. (Taiwan) )
- Yang, C. H. ( United Microelectronics Corp. (Taiwan) )
- Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61542D
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment [5992-92]
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Aqueous Based Single Wafer Cleaning Process Development and Integration Into 65 nm Process Flow Using Metal Hard Mask
Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Feasibility study of splitting pitch technology on 45-nm contact patterning with 0.93 NA
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Inspection of integrated circuit database through reticle and wafer simulation: the lithography process window performance monitoring [5992-141]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
SPIE-The International Society for Optical Engineering |