Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]

Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]

Author(s):

Hendrickx, E. ( IMEC (Belgium) )

Op de Beeck, M. ( IMEC (Belgium) )

Gronheid, R. ( IMEC (Belgium) )

Versluijs, J. ( IMEC (Belgium) )

Van Look, L. ( IMEC (Belgium) )

Ercken, M. ( IMEC (Belgium) )

Vandenberghe, G. ( IMEC (Belgium) )

2 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

2

Page(from):

61541X

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

Similar Items:

1 Conference Proceedings Dynamic leaching procedure on an immersion interference printer [6154-186] Gronheid, R., Tenaglia, E., Ercken, M. SPIE - The International Society of Optical Engineering	7 Conference Proceedings 60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography J. Bekaert, E. Hendrickx, G. Vandenberghe Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Immersion specific defect mechanisms: findings and recommendations for their control [6154-180] Kocsis, M., Van Den Heuvel, D., Gronheid, R., Maenhoudt, M., Vangoidsenhoven, D., Wells, G., Stepanenko, N., Benndorf, … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60] Chen, T., Van Den Broeke D, Hsu, S, Park S, Berger G, Coskun T, De Vocht J, Corcoran N, Chen F, Van der Heijden, Finders … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Progress in 193nm immersion lithography at IMEC Ronse, K., Vandenberghe, G., Hendrickx, E., Leunissen, L. H. A., Aksenov, Y. SPIE - The International Society of Optical Engineering	9 Conference Proceedings AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35 E. Hendrickx, R. Birkner, M. Kempsell, A. Tritchkov, G. Vandenberghe Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123] Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105] Kwak, E. A., Jung, M. R., Kim, D.-G., Lee, J.-E., Oh, H.-K., Lee, S. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications using RELACS shrink and corresponding OPC M. O. de Beeck, J. Versluijs, V. Wiaux, T. Vandeweyer, I. Ciofi, H. Struyf, D. Hendrickx, J. V. Olmen SPIE - The International Society of Optical Engineering	11 Conference Proceedings Second generation fluids for 193nm immersion lithography [6154-42] French, R. H., Qiu, W., Yang, M. K., Wheland, R. C., Lemon, M. F., Shoe, A. L., Adelman, D. J., Crawford, M. K., Tran, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings (Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA immersion lithography systems [6154-20] Gordon, R. L., Rimmer, M. P SPIE - The International Society of Optical Engineering	12 Conference Proceedings Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials B. M. Rathsack, S. Scheer, Y. Kuwahara, J. Kitano, R. Gronheid Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12