Predictive focus exposure modeling (FEM) for full-chip lithography [6154-66]
- Author(s):
Chen, L. ( Brion Technologies, Inc. (USA) ) Cao Y ( Brion Technologies, Inc. (USA) ) Liu H ( Brion Technologies, Inc. (USA) ) Shao W ( Brion Technologies, Inc. (USA) ) Feng M ( Brion Technologies, Inc. (USA) ) Ye, J ( Brion Technologies, Inc. (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61541T
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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