Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60]

Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60]

Author(s):

Chen, T. ( ASML MaskTools (USA) )

Van Den Broeke D ( ASML MaskTools (USA) )

Hsu, S ( ASML MaskTools (USA) )

Park S ( ASML MaskTools (USA) )

Berger G ( ASML MaskTools (USA) )

Coskun T ( ASML MaskTools (USA) )

De Vocht J ( ASML MaskTools (USA) )

Corcoran N ( ASML MaskTools (USA) )

Chen F ( ASML MaskTools (USA) )

Van der Heijden ( ASML (Netherlands) )

Finders J ( ASML (Netherlands) )

Engelen A ( ASML (Netherlands) )

Socha, R ( ASML TDC (USA) )

8 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

2

Page(from):

61541O

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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