Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation [6154-58]
- Author(s):
Hung, C. Y. ( Semiconductor International Manufacturing Corp. (China) ) Zhang, B. ( Semiconductor International Manufacturing Corp. (China) ) Guo, E. ( Semiconductor International Manufacturing Corp. (China) ) Pang, L. ( Luminescent Technologies, Inc. (USA) ) Liu Y ( Luminescent Technologies, Inc. (USA) ) Wang K ( Luminescent Technologies, Inc. (USA) ) Dai G ( Luminescent Technologies, Inc. (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61541M
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Validation of inverse lithography technology (ILT) and its adaptive SRAF at advanced technology nodes
Society of Photo-optical Instrumentation Engineers |
2
Conference Proceedings
Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142]
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Manufacturabilily study of masks created by inverse lithography technology (ILT) [5992-106]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
INVERSE LITHOGRAPHY TECHNOLOGY (ILT) AND ITS APPLICATIONS AT 65NM AND BEYOND
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |