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The improvement of DOF for sub-1OOnm process by focus scan [6154-56]

Author(s):
Kim, J. C. ( Hynix Semiconductor Inc. (South Korea) )
Yang, H. J. ( Hynix Semiconductor Inc. (South Korea) )
Jeon J.-H ( Hynix Semiconductor Inc. (South Korea) )
Park C.-H ( Hynix Semiconductor Inc. (South Korea) )
Moon, J ( Hynix Semiconductor Inc. (South Korea) )
Yim D ( Hynix Semiconductor Inc. (South Korea) )
Kim J. W ( Hynix Semiconductor Inc. (South Korea) )
Tseng S ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
Rhe K.-K ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
Min Y.-H ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
Chen A C ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
6 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. date:
2006
Pt.:
2
Page(from):
61541K
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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