Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes [6154-54]
- Author(s):
- Aksenov, Y. ( Philips Research Europe (Belgium) )
- Zandbergen, P. ( Philips Research Europe (Belgium) )
- Yoshizawa, M. ( Sony Corp. (Japan) and IMEC (Belgium) )
- Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61541H
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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