EMF simulation with DDM to enable EAPSM masks in 45nm manufacturing [6154-53]

EMF simulation with DDM to enable EAPSM masks in 45nm manufacturing [6154-53]

Author(s):

Martin, P. M. ( Photronics Inc. (USA) )

Progler, C. J. ( Photronics Inc. (USA) )

Cangemi, M. ( Photronics Inc. (USA) )

Adam K ( Mentor Graphics Corp (USA) )

Bailey G ( Mentor Graphics Corp. (USA) )

LaCour P ( Mentor Graphics Corp. (USA) )

1 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

61541G

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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