Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]

Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]

Author(s):

Yoshizawa, M. ( Sony Corp. (Japan) and IMEC (Belgium) )
Philipsen, V. ( IMEC (Belgium) )
Leunissen, L. H. A. ( IMEC (Belgium) )

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

61541E

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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