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High transmission mask technology for 45nm node imaging [6154-50]

Author(s):
Conley, W. ( Freescale Semiconductor, Inc. (USA) )
Morgana, N. ( Photronics Inc. (France) )
Kasprowicz B S ( Photronics Inc. (USA) )
Cangemi M ( Photronics Inc. (USA) )
Lassiter M ( Photronics Inc. (France) )
Litt L C ( Freescale Semiconductor, Inc. (USA) )
Cangemin M ( Photronlcs. Inc. (USA) )
Cottle R ( Photronlcs. Inc. (USA) )
Wu W ( Freescale Semiconductor, Inc. (USA) )
Cobb J ( Freescale Semiconductor, Inc. (USA) )
Ham Y M ( Photronlcs. Inc. (USA) )
Lucas, K. ( Freescale Semiconductor, Inc. (France) )
Roman, B. ( Freescale Semiconductor, Inc. (USA) )
Porgler, C. ( Photronlcs. Inc. (USA) )
9 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
1
Page(from):
61541D
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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