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High-index optical materials for 193-nm immersion Iithogrqphy [6154-45]

Author(s):
Burnett, J. H. ( National Institute of Standards and Technology (USA) )
Kaplan, S. G. ( National Institute of Standards and Technology (USA) )
Shirley, E. L. ( National Institute of Standards and Technology (USA) )
Horowitz, D. ( National Institute of Standards and Technology (USA) )
Clauss, W. ( Carl-Zeiss SMT AG (Germany) )
Grenville, A. ( SEMATECH (USA) and Intel Corp. (USA) )
Van Peski, C. ( SEMATECH (USA) )
2 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. date:
2006
Pt.:
1
Page(from):
615418
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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