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Inverse lithography technology at chip scale [6154-41]

Author(s):
Lin, B. ( United Microelectronic Corp. (Taiwan) )
Shieh, M. F. ( United Microelectronic Corp. (Taiwan) )
Sun, J. ( United Microelectronic Corp. (Taiwan) )
Ho, J. ( Xilinx Inc. (USA) )
Wang, Y. ( Xilinx Inc. (USA) )
Wu, X. ( Xilinx Inc. (USA) )
Leitermann, W. ( Xilinx Inc. (USA) )
Lin, O. ( Toppan Chunghwa Electronics (Taiwan) )
Lin, J. ( Toppan Chunghwa Electronics (Taiwan) )
Liu, Y. ( Luminescent Technologies, Inc. (USA) )
Pang, L. ( Luminescent Technologies, Inc. (USA) )
6 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
1
Page(from):
615414
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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