High transmission mask technology for 45nm node imaging [6154-38]

High transmission mask technology for 45nm node imaging [6154-38]

Author(s):

Conley, W. ( Freescale Semiconductor, Inc. (USA) )

Morgana, N. ( Photronics, Inc. (France) )

Kasprowicz, B. S. ( Photronics, Inc. (France) )

Cangemi, M. ( Photronics, Inc. (France) ) , ( Photronics, Inc. (USA) )

Lassiter, M. ( Photronics, Inc. (France) )

Litt, L. C. ( Freescale Semiconductor, Inc. (USA) )

Cottle, R. ( Photronics, Inc. (USA) )

Wu, W. ( Freescale Semiconductor, Inc. (USA) )

Cobb, J. ( Freescale Semiconductor, Inc. (USA) )

Ham, Y. -M. ( Photronics, Inc. (USA) )

Lucas, K. ( Freescale Semiconductor, Inc. (France) )

Roman, B. ( Freescale Semiconductor, Inc. (USA) )

Progler, C. ( Photronics, Inc. (USA) )

8 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

615411

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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