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Positive and negative tone double patterning lithography for 50nm flash memory [6154-37]

Author(s):
Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) )
Kim, S. M. ( Hynix Semiconductor Inc. (South Korea) )
Hwang, Y. S. ( Hynix Semiconductor Inc. (South Korea) )
Choi, J. -S. ( Hynix Semiconductor Inc. (South Korea) )
Ban, K. -D. ( Hynix Semiconductor Inc. (South Korea) )
Cho, S. -Y. ( Hynix Semiconductor Inc. (South Korea) )
Jung, J. K. ( Hynix Semiconductor Inc. (South Korea) )
Knag, E. -K. ( Hynix Semiconductor Inc. (South Korea) )
Lim, H. -Y. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H. -S. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S. -C. ( Hynix Semiconductor Inc. (South Korea) )
6 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
1
Page(from):
615410
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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