A dive into clear water: immersion defect capabilities [6154-28]

A dive into clear water: immersion defect capabilities [6154-28]

Author(s):

Streefkerk, B. ( ASML Netherlands B.V. (Netherlands) )

Nulkens, J. ( ASML Netherlands B.V. (Netherlands) )

Moerman, R. ( ASML Netherlands B.V. (Netherlands) )

Stacenga, M. ( ASML Netherlands B.V. (Netherlands) )

Van der Hoeven, J. ( ASML Netherlands B.V. (Netherlands) )

Grouwstra, C. ( ASML Netherlands B.V. (Netherlands) )

Bruis, R. ( ASML Netherlands B.V. (Netherlands) )

Leenders, M. ( ASML Netherlands B.V. (Netherlands) )

Wang. S. ( ASML Netherlands B.V. (Netherlands) )

Van Domelen, Y. ( ASML Netherlands B.V. (Netherlands) )

Boeremaa, M. ( ASML Netherlands B.V. (Netherlands) )

Jansen, H ( ASML Netherlands B.V. (Netherlands) )

Cummings, K ( ASML Netherlands B.V. (Netherlands) )

Riepen, M ( ASML Netherlands B.V. (Netherlands) )

Boom, H ( ASML Netherlands B.V. (Netherlands) )

Suddendorf, M ( ASML Netherlands B.V. (Netherlands) )

Huisman, P ( ASML Netherlands B.V. (Netherlands) )

12 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

61540S

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

Similar Items:

1 Conference Proceedings Immersion specific defect mechanisms: findings and recommendations for their control [6154-180] Kocsis, M., Van Den Heuvel, D., Gronheid, R., Maenhoudt, M., Vangoidsenhoven, D., Wells, G., Stepanenko, N., Benndorf, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Extending optical lithography with immersion Streefkerk, B., Baselmans, J., Gehoel-van Ansem, W., Mulkens, J., Hoogendam, C., Hoogendorp, M., Flagello, D.G., Sewell, … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Defects, overlay, and focus performance improvements with five generations of immersion exposure systems J. Mulkens, B. Streefkerk, H. Jasper, J. de Klerk, F. de Jong, L. Levasier, M. Leenders SPIE - The International Society of Optical Engineering	8 Conference Proceedings Watermark defect formation and removal for immersion lithography [6154-44] Chang, C. Y., Yu, D. C., Lin, J. C. H., Lin, B. J. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Immersion lithography exposure systems: today's capabilities and tomorrow's expectations Jan Mulkens, Bob Streefkerk, Martin Hoogendorp, Richard Moerman, Martijn Leenders, Fred de Jong, Marco Stavenga, Herman … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Defect testing using an immersion exposure system to apply immediate pre-exposure and post-exposure water soaks R. D. Watso, T. Laursen, B. Pierson, K. D. Cummings SPIE - The International Society of Optical Engineering
4 Conference Proceedings The next phase for immersion lithography [6154-06] Sewell, H., Mulkens, J., McCafferty, D., Markoya, L., Streefkerk, B., Graeupner, P. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Defect transfer from immersion exposure process to etching process using novel immersion exposure and track system O. Miyahara, H. Kosugi, S. Dunn, Y. van Dommelen, C. Grouwstra Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings ArF immersion lithography using TWINSCAN technology Mulkens, J., Streefkerk, B., Haagendorp, M. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Evaluation of partial coherent imaging using the transfer function in immersion lithography [6154-103] Jung, M. R., Kwak, E. A., Oh, H.-K., Shim, S.-B., Choi, N.-R., Kim, J.-S. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Investigation of immersion related defects using pre-and post-wet experiments [6154-29] Brandl, S., Watso, R., Pierson, B., Holmes, S., Wei, Y., Petrillo, K., Cummings, K., Goodwin, F. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105] Kwak, E. A., Jung, M. R., Kim, D.-G., Lee, J.-E., Oh, H.-K., Lee, S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12