Across wafer focus mapping and its applications in advanced technology nodes [6154-23]

Across wafer focus mapping and its applications in advanced technology nodes [6154-23]

Author(s):

Zhang, G. ( Texas Instruments Inc. (USA) )

DeMoor, S. ( Texas Instruments Inc. (USA) )

Jessen, S. ( Texas Instruments Inc. (USA) )

He, Q. ( Texas Instruments Inc. (USA) )

Yan, W. ( Texas Instruments Inc. (USA) )

Chevacharoenkul, S. ( Texas Instruments Inc. (USA) )

Vellanki, V. ( Benchmark Technologies (USA) )

Reynolds, P. ( Benchmark Technologies (USA) )

Ganeshan, J. ( ASML (USA) )

Hauschild, J. ( ASML (Netherlands) )

Pieters, M. ( ASML (Netherlands) )

6 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

61540N

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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