Alt-phase shift mask technology for 65nm logic applications [6154-22]
- Author(s):
Chakravorty, K. K. ( Intel Corp. (USA) ) Henrichs, S. ( Intel Corp. (USA) ) Qiu, W. ( Intel Corp. (USA) ) Chavez, J. L. ( Intel Corp. (USA) ) Liu, Y.-P. ( Intel Corp. (USA) ) Ghadiali, F. ( Intel Corp. (USA) ) Yung, K. ( Intel Corp. (USA) ) Wilcox, N. ( Intel Corp. (USA) ) Silva, M. ( Intel Corp. (USA) ) Ma, J. ( Intel Corp. (USA) ) Wu, P. ( Intel Corp. (USA) ) Irvine, B. ( Intel Corp. (USA) ) Yun, H. ( Intel Corp (USA) ) Cheng, W H ( Intel Corp (USA) ) Farnsworth, J ( Intel Corp (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61540M
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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