High NA polarized light lithography for O.29kl process [6154-15]
- Author(s):
Park, C. ( Hynix Semiconductor Inc. (South korea) ) Lee, J. ( Hynix Semiconductor Inc. (South korea) ) Yang, K. ( Hynix Semiconductor Inc. (South korea) ) Tseng, S. ( ASML TDC Asia (Taiwan) ) Min, Y.-H ( ASML TDC Asia (Taiwan) ) Yang, H. ( Hynix Semiconductor Inc. (South Korea) ) Yim, D. ( Hynix Semiconductor Inc. (South Korea) ) Kim, J. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61540F
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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