Blank Cover Image

High NA polarized light lithography for O.29kl process [6154-15]

Author(s):
Park, C. ( Hynix Semiconductor Inc. (South korea) )
Lee, J. ( Hynix Semiconductor Inc. (South korea) )
Yang, K. ( Hynix Semiconductor Inc. (South korea) )
Tseng, S. ( ASML TDC Asia (Taiwan) )
Min, Y.-H ( ASML TDC Asia (Taiwan) )
Yang, H. ( Hynix Semiconductor Inc. (South Korea) )
Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
1
Page(from):
61540F
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings The improvement of DOF for sub-1OOnm process by focus scan [6154-56]

Kim, J. C., Yang, H. J., Jeon J.-H, Park C.-H, Moon, J, Yim D, Kim J. W, Tseng S, Rhe K.-K, Min Y.-H, Chen A C

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]

Kwak, E. A., Jung, M. R., Kim, D.-G., Lee, J.-E., Oh, H.-K., Lee, S.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings How to obtain accurate resist simulations in very low-kl era- [6154-107]

Chiou T. B, Park C. H, Choi, J. S, Min Y.-H, Hansen S, Tseng S. E, Chen A C, Yim D

SPIE - The International Society of Optical Engineering
8 Conference Proceedings New architectures for high performance polymer light-emitting diodes introducing a solution-processed titanium oxide layer

S. H. Kim, J. Y. Kim, S. H. Park, K. Lee

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Cho, B.-H., Yim, D., Park, C.-H., Lee, S.-H., Yang, H.-J., Choi, J.-H., Shin, Y.-C., Kim, C.-D., Choi, J.-S., Kang, …

SPIE-The International Society for Optical Engineering
9 Conference Proceedings The feasibility study of KrFHT-PSM in ArF lithography process [6154-165]

Lim, Y. H., Kim, H. I., Choi, J. S., Lee, J. G.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Optimum field-size strategy for DRAM mass production in low-k1 process

Park,C.-H., Yim,D., Lee,S.-H., Yang,H.-J., Choi,J.-H., Shin,Y.-C., Kim,C.-D., Choi,J.-S., Kang,K.-O., Kim,S.-W., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Compensation of intrafield registration error caused by process properties in optical lithography

Lee,T.-G., Moon,S.-C., Lee,H.-M., Kim,J.-S., Lee,C.-S., Kim,H.-Y., Park,H.-K.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings CD control at low K1 optical lithography in DRAM device

Hong, J., Woo, C., Park, J., Cho, B., Choi, J.-S., Yang, H., Park, C., Shin, Y.-C., Kim, Y., Jeong, G., Kim, J., Kang, …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Effect of lens aberrations on OPC model accuracy for low kl lithography process [6154-116]

Ahn J. K, Jeong C. Y, Park J.-L, Choi J.-S, Lee J.-G

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Characteristics analysis of polarization module on optical proximity effect

C. Park, J. Hong, K. Yang, T. Theeuwes, F. Gautier, Y. Min, A. Chen, H. Yang, D. Yim, J. Kim

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Application of nanoimprint lithography to nano-optics: wire grid polarizer and photonic crystal LED

K. Lee, S. Kim, J. Park, J. Kim, S. Park

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12