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High NA polarized light lithography for O.29kl process [6154-15]

Author(s):
Park, C. ( Hynix Semiconductor Inc. (South korea) )
Lee, J. ( Hynix Semiconductor Inc. (South korea) )
Yang, K. ( Hynix Semiconductor Inc. (South korea) )
Tseng, S. ( ASML TDC Asia (Taiwan) )
Min, Y.-H ( ASML TDC Asia (Taiwan) )
Yang, H. ( Hynix Semiconductor Inc. (South Korea) )
Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. date:
2006
Pt.:
1
Page(from):
61540F
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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