Effect of azimuthally polarized illumination imaging on device patterns beyond 45-nm node [6154-12]

Effect of azimuthally polarized illumination imaging on device patterns beyond 45-nm node [6154-12]

Author(s):

Ozawa, K. ( Sony Corp. (Japan) )

Thunnakart, B ( Sony Corp. (Japan) )

Kaneguchi, T. ( Sony Corp. (Japan) )

Mita, I. ( Sony Corp. (Japan) )

Someya, A. ( Sony Corp. (Japan) )

Nakashima, T. ( Nikon Corp. (Japan) )

Mizuno, Y. ( Nikon Corp. (Japan) )

Matsuyama, T. ( Nikon Corp. (Japan) )

Hamatani, M. ( Nikon Corp. (Japan) )

4 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

61540C

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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