Enabling the 45nm node by hyper-NA polarized lithography [6154-11]

Enabling the 45nm node by hyper-NA polarized lithography [6154-11]

Author(s):

De Boeij, W. ( ASML Netherlands B.V. (Netherlands) )

Swinkels, G ( ASML Netherlands B.V. (Netherlands) )

Le Masson, N. ( ASML Netherlands B.V. (Netherlands) )

Koolen, A. ( ASML Netherlands B.V. (Netherlands) )

Van Greevembroek, H. ( ASML Netherlands B.V. (Netherlands) )

Klaassen, M. ( ASML Netherlands B.V. (Netherlands) )

Van de Kerkhof, M. ( ASML Netherlands B.V. (Netherlands) )

Van Ingen Schenau, K. ( ASML Netherlands B.V. (Netherlands) )

De Winter, L. ( ASML Netherlands B.V. (Netherlands) )

Wehrens, M. ( ASML Netherlands B.V. (Netherlands) )

Hansen, S. ( ASML Netherlands B.V. (Netherlands) )

Wagner, C. ( ASML Netherlands B.V. (Netherlands) )

7 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

61540B

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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