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Enabling the 45nm node by hyper-NA polarized lithography [6154-11]

Author(s):
De Boeij, W. ( ASML Netherlands B.V. (Netherlands) )
Swinkels, G ( ASML Netherlands B.V. (Netherlands) )
Le Masson, N. ( ASML Netherlands B.V. (Netherlands) )
Koolen, A. ( ASML Netherlands B.V. (Netherlands) )
Van Greevembroek, H. ( ASML Netherlands B.V. (Netherlands) )
Klaassen, M. ( ASML Netherlands B.V. (Netherlands) )
Van de Kerkhof, M. ( ASML Netherlands B.V. (Netherlands) )
Van Ingen Schenau, K. ( ASML Netherlands B.V. (Netherlands) )
De Winter, L. ( ASML Netherlands B.V. (Netherlands) )
Wehrens, M. ( ASML Netherlands B.V. (Netherlands) )
Hansen, S. ( ASML Netherlands B.V. (Netherlands) )
Wagner, C. ( ASML Netherlands B.V. (Netherlands) )
7 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. date:
2006
Pt.:
1
Page(from):
61540B
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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