Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]

Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]

Author(s):

Kocsis, M. ( IMEC (Belgium) and Intel Corp. (USA) )

Van Den Heuvel, D. ( IMEC (Belgium) )

Gronheid, R. ( IMEC (Belgium) )

Maenhoudt, M. ( IMEC (Belgium) )

Vangoidsenhoven, D. ( IMEC (Belgium) )

Wells, G. ( IMEC (Belgium) and Texas Instruments Inc. (USA) )

Stepanenko, N. ( IMEC (Belgium) and Technologies SC300GmbH & Co. OHG (Germany) )

Benndorf, M. ( Philips Research Europe (Belgium) )

Kim, H. W ( IMEC (Belgium) and Samsung Electronics Co. Ltd. (South Kored) )

Kishimura, S. ( IMEC (Belgium) and Matsushita Electric Industrial Co. Ltd, (Japan) )

Ercken, M. ( IMEC (Belgium) )

Van Roey, F. ( IMEC (Belgium) )

O’Brien, S. ( IMEC (Belgium) and Texas Instruments Inc, (USA) )

Fyen, W. ( IMEC IMEC (Belgium) )

Foubert, P ( IMEC IMEC (Belgium) )

Moerman, R ( ASML (Netherlands) )

Streefkerk, B. ( ASML (Netherlands) )

12 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

615409

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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