Immersion lithography robustness for the C065 node [6154-07]

Immersion lithography robustness for the C065 node [6154-07]

Author(s):

Warrick, S. ( Freescale Semiconductors (France) )

Morton, R. ( Philips Semiconductors (France) )

Mauri, A. ( STMicroelectronics (France) )

Chapon, J. D ( STMicroelectronics (France) )

Belledent, J. ( Philps Semiconductors (France) )

Conley, W. ( Freescale Semiconductors (France) )

Barr, A. ( Freescale Semiconductors (France) )

Lucas, K. ( Freescale Semiconductors (France) )

Monget, C. ( STMicroelectronics (France) )

Plantier, V. ( Philips Semiconductors (France) )

Cruau, D. ( Freescale Semiconductors (France) )

Gomez, J.-M. ( Freescale Semiconductors (France) )

Sicurani, E ( CEA (France) )

Gemmink, J-W. ( Philips Semiconductors (France) )

9 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

615407

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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