The optics of photomasks: from shadowy past to scattered future (Invited Paper) [6154-02]

The optics of photomasks: from shadowy past to scattered future (Invited Paper) [6154-02]

Author(s):: Progler, C. J. ( Photronics. Inc. (USA) )
Publication title:: Optical Microlithography XIX
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 6154
Pub. Year:: 2006
Pt.:: 1
Page(from):: 615402
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819461971 [0819461970]
Language:: English
Call no.:: P63600/6154
Type:: Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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