From optical proximity correction to lithography-driven physical design (1996-2006): 10 years of resolution enhancement technology and the road map enablers for the next decade (Invited Paper) [6.154-01]

From optical proximity correction to lithography-driven physical design (1996-2006): 10 years of resolution enhancement technology and the road map enablers for the next decade (Invited Paper) [6.154-01]

Author(s):: Capodieci, L. ( Advanced Micro Devices (USA) )
Publication title:: Optical Microlithography XIX
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 6154
Pub. Year:: 2006
Pt.:: 1
Page(from):: 615401
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819461971 [0819461970]
Language:: English
Call no.:: P63600/6154
Type:: Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

Similar Items:

1 Conference Proceedings Design-driven metrology: a new paradigm for DFM-enabled process characterization and control, extensibility, and limitations (Invited Paper) [6152-01] Capodieci, L. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Revised SIA road map for mask technology (Invited Paper) Canning,J. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Resolution enhancement technologies in optical metrology (Invited Paper) Osten, W., Kerwien, N. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Two decades of progress in optical fiber processing technology (Invited Paper) Saifi,M.A. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Advanced high-resolution mask processes using optical proximity correction (Invited Paper) Chan, Y. D. SPIE - The International Society of Optical Engineering	9 Conference Proceedings 10 Gb/s CMOS photonics technology (Invited Paper) [6125-01] Gunn, C. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Focus blur model to enhance lithography model for optical proximity correction Q. Zhang, H. Song, K. Lucas Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Evanescent wave imaging in optical lithography [6154-10] Smith, B. W., Fan, Y., Zhou, J., Lafferty, N., Estroff, A. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Electrically driven optical proximity correction S. Banerjee, P. Elakkumanan, L. W. Liebmann, J. A. Culp, M. Orshansky Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Limitation of optical lithography for various resolution enhancement technologies Eom, T.-S., Ahn, C.-N., Park, D.-H., Koh, C.-W., Bok, C.-K. SPIE-The International Society for Optical Engineering
6 Conference Proceedings A 10G Qos-enabled optical packet-switching system: technology and experimentation (Invited Paper) [6354-02] Lee, S. S. W., Yuang, M. C., Tien, P.-L., Lin, Y.-M., Shih, J., Chen, J. J. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Photomask and lithography technologies: past 10 years and what will come next (Keynote Address) Hoh, K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12