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Development of multi-function hard mask to simplify process step [6153-108]

Author(s):
Lee, K. ( Hynix Semiconductor Inc. (South Korea) )
Kim, S. ( Hynix Semiconductor Inc. (South Korea) )
Lee, G. ( Hynix Semiconductor Inc. (South Korea) )
Lee, S. ( Hynix Semiconductor Inc. (South Korea) )
Cho J ( Hynix Semiconductor Inc. (South Korea) )
Kim W ( Hynix Semiconductor Inc. (South Korea) )
Bok C ( Hynix Semiconductor Inc. (South Korea) )
Kim H ( Hynix Semiconductor Inc. (South Korea) )
Moon S ( Hynix Semiconductor Inc. (South Korea) )
Kim J ( Hynix Semiconductor Inc. (South Korea) )
5 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. date:
2006
Pt.:
2
Page(from):
61532V
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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