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Molecular resists based on cholate derivatives for electron-beam lithography [6153-87]

Author(s):
Shiono, D. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) )
Hirayama, T. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) )
Hada, H. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) )
Onodera, J. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) )
Arai, T. ( Hitachi, Ltd. (Japan) )
Yamaguchi, A. ( Hitachi, Ltd. (Japan) )
Kojima, K. ( Hitachi, Ltd. (Japan) )
Shiraishi, H. ( Hitachi, Ltd. (Japan) )
Fukuda, H. ( Hitachi, Ltd. (Japan) )
4 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
2
Page(from):
61532D
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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