Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]

Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]

Author(s):

Kudo, T. ( AZ Electronic Materials USA Corp. (USA) )

Lin, G. ( AZ Electronic Materials USA Corp. (USA) )

Lee, D. ( AZ Electronic Materials USA Corp. (USA) )

Rahman, D. ( AZ Electronic Materials USA Corp. (USA) )

Timko, A. ( AZ Electronic Materials USA Corp. (USA) )

Mckenzie, D. ( AZ Electronic Materials USA Corp. (USA) )

Anyadiegwu, C. ( AZ Electronic Materials USA Corp. (USA) )

Chiu, S. ( AZ Electronic Materials USA Corp. (USA) )

Houlihan, F. ( AZ Electronic Materials USA Corp. (USA) )

Rentkiewicz, D. ( AZ Electronic Materials USA Corp. (USA) )

Dammel, R. R. ( AZ Electronic Materials USA Corp. (USA) )

Padmanaban, M. ( AZ Electronic Materials USA Corp. (USA) )

Biafore, J. ( KLA-Tencor Corp. (USA) )

8 more

Publication title:

Advances in Resist Technology and Processing XXIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6153

Pub. Year:

2006

Pt.:

2

Page(from):

61532C

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

Language:

English

Call no.:

P63600/6153

Type:

Conference Proceedings

Details

TDL ID:	ZA00016185
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2006 : 23th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.22

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