Adamantane based molecuiar glass resist for 193 nm lithography [6153-85]

Adamantane based molecuiar glass resist for 193 nm lithography [6153-85]

Author(s):

Tanaka, S ( Cornell Univ (USA) and Idemitsu Kosan Co Ltd (Japan) )
Ober, C K ( Cornell Univ (USA) )

Publication title:

Advances in Resist Technology and Processing XXIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6153

Pub. Year:

2006

Pt.:

1

Page(from):

61532B

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

Language:

English

Call no.:

P63600/6153

Type:

Conference Proceedings

Details

TDL ID:	ZA00016185
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2006 : 23th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.22

Similar Items:

1 Conference Proceedings Adamantane-based molecular gloss resist for 193-nm lithography and beyond S. Tanaka, N. Matsumoto, H. Ohno, N. Hatakeyama, K. Ito Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Block and random copolymer resists designed for 193-nm lithography and environmentally friendly supercritical CO2 development Gabor,A.H., Allen,R.D., Gallagher-Wetmore,P.M., Ober,C.K. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Nanomolecular resists with adamantane core for 193-nm lithography Kim, S.-K., An, I., Oh, H.-K., Lee, S. M., Bok, C. K., Moon, S. C. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Fluoropolymer resists for 157 nm lithography Vohra, V.R., Liu, X.-Q., Douki, K., Ober, C.K., Conley, W., Zimmerman, P., Miller, D. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Molecular glass resists for next-generation lithography [6153-50] Bratton, D., Ayothi, R., Felix, N., Cao, H., Deng, H., Ober, C. K. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Water-developable resists based on glyceryl methacrylate for 193-nm lithography Kim, J.-B., Jang, J.-H., Choi, J.-H., Lee, K.-K., Ko, J.-S. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Development of an operational high refractive index resist for 193nm immersion lithography P. A. Zimmerman, J. Byers, E. Piscani, B. Rice, C. K. Ober Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Feasibility of a CVD-resist-based lithography process at 193-nm wavelength Lee,C.Y., Das,S., Yang,J., Weidman,T.W., Sugiarto,D., Nault,M., Mui,D., Osborne,Z.A. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Progress of topcoat and resist development for 193nm immerison lithography [6153-72] Ohmori, K, Ando, T, Takayama, T, Ishizuka, K, Yoshida, M, Utsumi, Y, Endo, K, Iwai, T SPIE - The International Society of Optical Engineering	11 Conference Proceedings Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20] Burns, S, Pfeiffer, D, Mahorowala, A, Petrillo, K, Clancy, A, Babich, K, Medeiros D, Allen, S, Holmes, S, Crouse, M, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation Bravo-Vasquez, J. P., Kwark, Y.-J., Ober, C. K., Cao, H. B., Deng, H. SPIE - The International Society of Optical Engineering	12 Conference Proceedings High-index resist for 193-nm immersion lithography K. Matsumoto, E. Costner, I. Nishimura, M. Ueda, C. G. Willson Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12