193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate [6153-14]

193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate [6153-14]

Author(s):

Rahman, M D ( AZ Electronic Materials (USA) )

Chakrapani, S ( AZ Electronic Materials (USA) )

Anyadiegwu, C ( AZ Electronic Materials (USA) )

Lin, G ( AZ Electronic Materials (USA) )

Timko, A ( AZ Electronic Materials (USA) )

Houlihan, F ( AZ Electronic Materials (USA) )

Rentkiewicz, D ( AZ Electronic Materials (USA) )

Kudo, T ( AZ Electronic Materials (USA) )

McKenzie, D

Dammel, R ( AZ Electronic Materials (USA) )

Padmanaban, M ( AZ Electronic Materials (USA) )

6 more

Publication title:

Advances in Resist Technology and Processing XXIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6153

Pub. Year:

2006

Pt.:

1

Page(from):

615327

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

Language:

English

Call no.:

P63600/6153

Type:

Conference Proceedings

Details

TDL ID:	ZA00016185
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2006 : 23th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.22

Similar Items:

1 Conference Proceedings Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions Rahman,M.D., McKenzie,D.S., Bae,J.-B., Kudo,T., Kim,W.-K., Padmanaban,M., Dammel,R.R. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Some non-resist component contributions to LER and LWR in 193-nm lithography T. Kudo, S. Chakrapani, G. Lin, C. Anyadiegwu, C. Antonio, D. Parthasarathy, R. R. Dammel, M. Padmanaban SPIE - The International Society of Optical Engineering
2 Conference Proceedings High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate Rahman, M.D., Alemy, E., Conley, W., Miller, D., Dammel, R.R., Kim, W.-K., Kudo, T., Lee, S.-H., Masuda, S., McKenzie, … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Performanc of dry resist under wet conditions [6153-07] Padmanaban, M, Romano, A, Lin, G., Chiu, S, Timko, A, Houlihan, F, Rahman, D, Chakrapani, S, Kudo, T, Dammel, R. R., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86] Kudo, T., Lin, G., Lee, D., Rahman, D., Timko, A., Mckenzie, D., Anyadiegwu, C., Chiu, S., Houlihan, F., Rentkiewicz, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings PEB sensitivity studies of ArF resists: II. Polymer and solvent effects Hong, C.-S., Lee, S.-H., Kim, W.-K., Kudo, T., Timko, A., Mckenzie, D., Anyadiegwu, C., Rahman, D.M., Lin, G., Dammel, … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions Rahman,M.D., Bae,J.-B., Cook,M.M., Durham,D.L., Kudo,T., Kim,W.-K., Padmanaban,M., Dammel,R.R. SPIE - The International Society for Optical Engineering	10 Conference Proceedings PEB sensitivity studies of ArF resist Lee, S.H., Kim, W.-K., Rahman, D.M., Kudo, T., Timko, A., Anyadiegwu, C., McKenzie, D.S., Kanda, T., Dammel, R.R., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions Rahman, M. D., Dammel, R. R., Cook, M. M., Ficner, S. A., Padmanaban, M., Oberlander, J. E., Durham, D., Klauck-Jacobs, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings CD changes of 193-nm resists during SEM measurement Kudo,T., Bae,J.-B., Dammel,R.R., Kim,W.-K., McKenzie,D.S., Rahman,M.D., Padmanaban,M., Ng,W. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Study of the effect of amine additives on LWR and LER [6153-44] Houlihan, F. M., Rentkiewicz, D., Lin, G., Rahman, D., Mackenzie, D., Timko, A., Kudo, T., Anyadiegwu, C., Thiyagarajan, … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Performance of imide and methide onium PAGs in 193-nm resist formulations Padmanaban, M., Dammel, R.R., Lee, S.H., Kim, W.-K., Kudo, T., McKenzie, D.S., Rahman, D. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12