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Polymer structure modifications for immersion leaching and watermark control [6153-77]

Author(s):
Lee, J W ( Dongjin Semichem Co Ltd (South Korea) )
Oh, S K ( Dongjin Semichem Co Ltd (South Korea) )
Kim, J W ( Dongjin Semichem Co Ltd (South Korea) )
Lee, S H ( Dongjin Semichem Co Ltd (South Korea) )
Jeong, Y H ( Dongjin Semichem Co Ltd (South Korea) )
Kim, S S ( Dongjin Semichem Co Ltd (South Korea) )
Park, M H ( Dongjin Semichem Co Ltd (South Korea) )
Kim, D ( Dongjin Semichem Co Ltd (South Korea) )
Kim, J ( Dongjin Semichem Co Ltd (South Korea) )
Lee, G ( Hynix Semiconductor Co Ltd (South Korea) )
Moon, S C ( Hynix Semiconductor Co Ltd (South Korea) )
6 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. date:
2006
Pt.:
1
Page(from):
615311
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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