The effect of photoresist/topcoat properties on defect formation in immersion lithography [6153-59]
- Author(s):
Wallraff, G. M. ( IBM Almaden Research Ctr. (USA) ) Larson, C. E. ( IBM Almaden Research Ctr. (USA) ) Breyta, G. ( IBM Almaden Research Ctr. (USA) ) Sundberg, L. ( IBM Almaden Research Ctr. (USA) ) Miller, D. ( IBM Almaden Research Ctr. (USA) ) Gil, D. ( IBM Albany Nanotech (USA) ) Petrillo, K. ( IBM Albany Nanotech (USA) ) Pierson, W. ( ASML Netherlands B.Y. (Netherlands) ) - Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61531M
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
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