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Double exposure technology using silicon containing materials [6153-57]

Author(s):
Lee, S. ( Hynix Semiconductor Inc. (South Korea) )
Jung, J. ( Hynix Semiconductor Inc. (South Korea) )
Cho, S. ( Hynix Semiconductor Inc. (South Korea) )
Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. date:
2006
Pt.:
1
Page(from):
61531K
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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