Dissolution fundamentals of 193-nm methacrylate-based photoresists [6153-37]

Author(s):

Rao, A. ( National Institute of Standards and Technology (USA) )

Kang, S. ( National Institute of Standards and Technology (USA) )

Vogt, B. D. ( National Institute of Standards and Technology (USA) )

Prabhu, V. M. ( National Institute of Standards and Technology (USA) )

Lin, E.K. ( National Institute of Standards and Technology (USA) )

Wu, W.L. ( National Institute of Standards and Technology (USA) )

Turnquest, K. ( SEMATECH Inc. (USA) )

Hinsberg,W.D ( IBM Almaden Research Ctr. (USA) )

3 more

Publication title:

Advances in Resist Technology and Processing XXIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6153

Pub. Year:

2006

Pt.:

1

Page(from):

615310

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

Language:

English

Call no.:

P63600/6153

Type:

Conference Proceedings