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Spin-on hard mask with dual-BARC property for 50-nm devices [6153-21]

Author(s):
Hah, J H ( Samsung Electronics Co Ltd (South Korea) )
Chae, Y S ( Samsung Electronics Co Ltd (South Korea) )
Jang Y K ( Samsung Electronics Co Ltd (South Korea) )
Ryoo, M ( Samsung Electronics Co Ltd (South Korea) )
Choi, S J ( Samsung Electronics Co Ltd (South Korea) )
Woo, S G ( Samsung Electronics Co Ltd (South Korea) )
Cho, H K ( Samsung Electronics Co Ltd (South Korea) )
Moon, J T ( Samsung Electronics Co Ltd (South Korea) )
3 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
61530L
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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