Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20]
- Author(s):
Burns, S ( IBM Thomas J Watson Research Ctr (USA) ) Pfeiffer, D ( IBM Thomas J Watson Research Ctr (USA) ) Mahorowala, A ( IBM Thomas J Watson Research Ctr (USA) ) Petrillo, K Clancy, A ( IBM Thomas J Watson Research Ctr (USA) ) Babich, K ( IBM Thomas J Watson Research Ctr (USA) ) Medeiros D ( IBM Thomas J Watson Research Ctr (USA) ) Allen, S ( IBM Microelectronics Division (USA) ) Holmes, S ( IBM Microelectronics Division (USA) ) Crouse, M ( IBM Microelectronics Division (USA) ) Brodsky, C ( IBM Microelectronics Division (USA) ) Pham, V ( IBM Microelectronics Division (USA) ) Lin, Y H ( IBM Microelectronics Division (USA) ) Patel, K ( IBM Microelectronics Division (USA) ) Lustig, N ( IBM Microelectronics Division (USA) ) Gabor, A ( IBM Microelectronics Division (USA) ) Sheraw, C ( IBM Microelectronics Division (USA) ) Brock, P ( IBM Almaden Research Ctr (USA) ) Larson, C ( IBM Almaden Research Ctr (USA) ) - Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61530K
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
193-nm negative resist based on acid-catalyzed elimination of polar molecules
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Selection and evaluation of developer-soluble topcoat for 193nm immersion lithography [6153-71]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
The effect of photoresist/topcoat properties on defect formation in immersion lithography [6153-59]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |