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Synthesis of high rrefractive index sulfur containing polymers for 193nm immersion lithography: a progress report [6153-69]

Author(s):
Blakey, I ( The Univ of Queensland (Australia) )
Conley, W ( Freescale Semiconductor, SEMATECH (USA) )
George, G A ( Queensland Univ of Technology (Australia) )
Hill, D J ( The Univ of Queensland (Australia) )
Liu, H ( The Univ of Queensland (Australia) )
Whittaker, A K ( The Univ of Queensland (Australia) )
1 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. date:
2006
Pt.:
1
Page(from):
61530H
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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