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New high-index fluids for immersion lithography [6153-11]

Author(s):
Costner, E ( The Univ of Texas at Austin (USA) )
Taylor, J C ( The Univ of Texas at Austin (USA) )
Caporale, S ( The Univ of Texas at Austin (USA) )
Wojtczak, W ( SACHEM, Inc (USA) )
Dewulf, D ( SACHEM, Inc (USA) )
Conley, W ( Freescale Semiconductor, SEMATECH, Inc (USA) )
Willson, C G ( The Univ of Texas at Austin (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
61530B
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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