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Robust defect detection method using reference image averaging for high-throughput SEM wafer pattern inspection system [6152-181]

Author(s):
  • Okuda, H. ( Hitachi Ltd. (Japan) )
  • Hiroi, T ( Hitachi High- Technologies Corp. (Japan) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
61524F
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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