Blank Cover Image

Spatial analysis of line-edge roughness through scaling and fractal concepts using AFM techniques [6152-167]

Author(s):
  • Li, N. ( Harbin Institute of Technology (China) )
  • Zhao, X. ( Harbin Institute of Technology (China) )
  • Wang, W. ( Harbin Institute of Technology (China) )
  • Li, H. ( Harbin Institute of Technology (China) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
615246
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Application of cellular neural networks in the measurement of Iinewidth and line edge roughness [6150-115]

Li, H., Zhao, X., Chu, W., Li, N.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Amplitude and spatial frequency characterization of line-edge roughness using CD-SEM

Eytan, G., Dror, O., Ithier, L., Florin, B., Lamouchi, Z., Martin, N.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Characterization of line edge roughness using CD-SAXS [6152-23]

Jones, R.J., Wu, W., Wang, C., Lin, E. K., Choi, K., Rice, B. J., Thompson, G. M., Weigand, S. J., Keane, D. T

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Characterization of line-edge roughness in photoresist using an image fading technique

Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Photoresist line-edge roughness analysis using scaling concepts

Constantoudis, V., Patsis, G.P., Gogolides, E.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists

Prabhu, V.M., Wang, M.X., Jablonski, E.L., Vogt, B.D., Lin, E.K., Wu, W.-L., Goldfarb, D.L., Angelopoulos, M., Ito, H.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Macro analysis of line edge and line width roughness [6152-33]

Shin, J., Yoon, J., Jung, Y., Lee, S., Woo, S. G., Cho, H. -K., Moon, J. -T.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Photosensitivity and line-edge roughness of novel polymer-bound PAG photoresists

C. Lee, M. Wang, N. D. Jarnagin, K. E. Gonsalves, J. M. Roberts, W. Yueh, C. L. Henderson

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Theoretical analysis of line-edge roughness using FFT techniques

Ohfuji, T., Endo, M., Morimoto, H.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Aerial image contrast using interferometric lithography: effect on line-edge roughness

Sanchez, M. I., Hinsberg, W. D., Houle, F. A., Hoffnagle, J. A., Ito, H., Nguyen, C.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Spatial frequency analysis of line-edge roughness in nine chemically related photoresists

Lawrence, W.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Impact of floating population on the epidemic of tuberculosis: a spatial analysis

Z. Jia, X. He, W. Zhao, Y. An, W. Cao, X. Li

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12