Blank Cover Image

Characterizing optical proximity effect difference among exposure tools [6152-103]

Author(s):
Hong, J. ( Hynix Semiconductor Inc. (South Korea) )
Lee, J. ( Hynix Semiconductor Inc. (South Korea) )
Kang, E. ( Hynix Semiconductor Inc. (South Korea) )
Yang, H. ( Hynix Semiconductor Inc. (South Korea) )
Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. date:
2006
Pt.:
2
Page(from):
61522N
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Characteristics analysis of polarization module on optical proximity effect

C. Park, J. Hong, K. Yang, T. Theeuwes, F. Gautier, Y. Min, A. Chen, H. Yang, D. Yim, J. Kim

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Cho, B.-H., Yim, D., Park, C.-H., Lee, S.-H., Yang, H.-J., Choi, J.-H., Shin, Y.-C., Kim, C.-D., Choi, J.-S., Kang, …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings New OPC verification method using die-to-database inspection [6152-119]

Yang, H., Choi, J., Cho, B, Hong, J., Song, J., Yim, D., Kim, J., Yamamoto. M.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Tools to measure CD-SEM performance [6152-29]

Kim, J., Jalhadi, K., Deo, S., Lee, S. Y., Joy, D.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Wide applications of design based metrology with tool integration

H. Yang, J. Kim, A. Jung, T. Lee, D. Yim

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Application of full-chip optical proximity correction for sub-60-nm memory device in polarized illumination

H. Yune, Y. Ahn, D. Lee, J. Moon, B. Nam, D. Yim

SPIE - The International Society of Optical Engineering
4 Conference Proceedings CD control at low K1 optical lithography in DRAM device

Hong, J., Woo, C., Park, J., Cho, B., Choi, J.-S., Yang, H., Park, C., Shin, Y.-C., Kim, Y., Jeong, G., Kim, J., Kang, …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Effect of Saccharin Concentration on the Microstructure of the Electrodeposited Ni-Fe

Kim, S.-H., Kang, T., Sohn, H.-J., Joo, Y.-C., Kim, Y.-W., Yim, F-H., Lee, H.-Y.

Electrochemical Society
5 Conference Proceedings Stray-light implementation in optical proximity correction (OPC)

Y. -C. Kim, D. Kim, I. Kim, S. Kim, S. Suh, Y. -J. Chun, S. Lee, J. Lee, C. -J. Kang, J. Moon, K. Taravade

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Spatial optical modulator (SOM): high-density diffractive laser projection display

S. Yun, J. Song, I. Yeo, Y. Choi, V. Yurlov, S. An, H. Park, H. Yang, Y. Lee, K. Han, I. Shyshkin, A. Lapchuk, K. Oh, S. …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings In-line-focus monitoring technique using lens aberration effect

Yang, H., Choi, J., Cho, B., Yim, D., Kim, J.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Advanced process control with design-based metrology

H. Yang, J. Kim, J. Hong, D. Yim, T. Hasebe, M. Yamamoto

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12