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Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100]

Author(s):
Yang, D. S. ( Samsung Electronics (South Korea) )
Jung, M. H. ( Samsung Electronics (South Korea) )
Lee, Y. M. ( Samsung Electronics (South Korea) )
Koh, C. W. ( Samsung Electronics (South Korea) )
Yeo, G. S. ( Samsung Electronics (South Korea) )
Woo, S. G. ( Samsung Electronics (South Korea) )
Cho, H. K. ( Samsung Electronics (South Korea) )
Moon, J. T. ( SAMUNG Electronics Co Ltd (South Korea) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
61522K
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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