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The study to enhance the accuracy of FIB repair on mask pattern of DRAM [6152-94]

Author(s):
  • Choi, Y. ( Hynix Semiconductor (South Korea) )
  • Kim, H. ( Hynix Semiconductor (South Korea) )
  • Kim, S. ( Hynix Semiconductor (South Korea) )
  • Han, O. ( Hynix Semiconductor (South Korea) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
61522H
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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