ArF scanner performance improvement by using track integrated CD optimization [6152-80]
- Author(s):
Huang, J. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Yu, S. S ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Ke, C M ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Wu, T ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Wang, Y. H ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Gau, T S ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Wang, D ( Tokyo Electron Ltd. (Japan) ) Li, A ( Tokyo Electron Ltd. (Japan) ) Yang, W ( Tokyo Electron Ltd. (Japan) ) Kaoru, A - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 615228
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
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