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Electron-beam-based moditication of lithographic materials and the impacr on critical dimensional metrology [6152-79]

Author(s):
Marchamn, H ( KLA-Tencor (USA) )
Lorusso, G. F ( IMEC (Belgium) )
Soltz, D ( KLA-Tencor (USA) )
Grella, L ( KLA-Tencor (USA) )
Lou, Z ( KLA-Tencor (USA) )
Byers, J. D ( IMEC (Belgium) )
Varner, J ( KLA-Tencor (USA) )
Vedula, S ( KLA-Tencor (USA) )
Kuppa, R ( KLA-Tencor (USA) )
Azordegan, A. R ( KLA-Tencor (USA) )
Storms, G. ( IMEC (Belgium) )
Leunissen, L. H. ( IMEC (Belgium) )
7 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
615227
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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