Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections [6152-71]
- Author(s):
Verhaegen, S. ( IMEC (Belgium) ) Nackaerts, A. ( IMEC (Belgium) ) Dusa, M. ( ASML US Inc. (USA) ) Carpaij, R. ( ASML Netherlands B.V. (Netherlands) ) Vandenberghe, G. ( IMEC (Belgium) ) Finders, J. ( ASML Netherlands B.V. (Netherlands) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61521Y
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
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